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Optical aberrations have detrimental effects in multiphoton microscopy. These effects can be curtailed by implementing model-based wavefront sensorless adaptive optics, which only requires the addition of a wavefront shaping device, such as a deformable mirror (DM) to an existing microscope. The aberration correction is achieved by maximizing a suitable image quality metric. We implement a model-based aberration correction algorithm in a second-harmonic microscope. The tip, tilt, and defocus aberrations are removed from the basis functions used for the control of the DM, as these aberrations induce distortions in the acquired images. We compute the parameters of a quadratic polynomial that is used to model the image quality metric directly from experimental input-output measurements. Finally, we apply the aberration correction by maximizing the image quality metric using the least-squares estimate of the unknown aberration.

Type

Journal article

Journal

J Opt Soc Am A Opt Image Sci Vis

Publication Date

01/06/2014

Volume

31

Pages

1337 - 1347

Keywords

Algorithms, Artifacts, Equipment Design, Equipment Failure Analysis, Image Enhancement, Lenses, Microscopy, Fluorescence, Multiphoton, Refractometry, Signal Processing, Computer-Assisted