Cookies on this website

We use cookies to ensure that we give you the best experience on our website. If you click 'Accept all cookies' we'll assume that you are happy to receive all cookies and you won't see this message again. If you click 'Reject all non-essential cookies' only necessary cookies providing core functionality such as security, network management, and accessibility will be enabled. Click 'Find out more' for information on how to change your cookie settings.

We propose a hologram design process which aims at reducing aberrations in parallel three-dimensional direct laser writing applications. One principle of the approach is to minimise the diffractive power of holograms while retaining the degree of parallelisation. This reduces focal distortion caused by chromatic aberration. We address associated problems such as the zero diffraction order and aberrations induced by a potential refractive index mismatch between the immersion medium of the microscope objective and the fabrication substrate. Results from fabrication in diamond, fused silica and lithium niobate are presented.

Original publication

DOI

10.1364/OE.18.021090

Type

Journal article

Journal

Opt Express

Publication Date

27/09/2010

Volume

18

Pages

21090 - 21099

Keywords

Algorithms, Color, Colorimetry, Equipment Design, Imaging, Three-Dimensional, Lasers, Lenses, Light, Models, Statistical, Optics and Photonics, Refractometry